June 17, 2003 – Veeco Instruments, Woodbury, NY, and Schott Lithotech, Jena, Germany, have signed an agreement to develop advanced photomask technologies.
Under the deal, Schott will provide materials and process technology expertise in next-generation photomask blanks, and Veeco will offer expertise in low defect ion beam deposition.
The development will take place in Germany and in New York, where both companies have R&D facilities.