Nikon, Dainippon Screen team for photolithography

July 7, 2003 – Dainippon Screen and Nikon have agreed to co-develop next-generation photolithography processes for semiconductor fabrication. The two companies will work to share data between Dainippon’s photoresist coater/developers and Nikon’s steppers, and develop a control system to automatically adjust them for changes in process conditions, ultimately boosting production yields.


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