Nikon debuts metrology tool

August 4, 2003 – Nikon Semiconductor Inspection Technologies Group (SITECH) has unveiled a metrology tool designed for the 90nm node and below. The NRM-3100 is designd to measure lithographic exposure with enough bandwidth to accommodate the 70nm node, and boasts throughput of over 150 wafers per hour. Additional options include a focus mark measurement and stepper and angle management systems.


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