AMAT steps into SEM metrology

September 9, 2003 – Applied Materials, Santa Clara, CA, has unveiled a new tool for 65nm-generation mask metrology, adding to its line of pattern generation, etch, and inspection tools.

Based on the company’s NanoSEM 3D platform, the RETicleSEM offers 2.8nm resolution with support for various materials and mask technologies. AMAT says it several RETicleSEM systems have already been shipped to customers.


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