August 27, 2003 – Elpida Memory, a Tokyo, Japan JV between Hitachi and NEC, and Toppan Printing Co. have agreed to co-develop photomasks for sub-100nm DRAM chips. The photomasks will be used on chips produced at Elpida’s 300mm facility in Hiroshima.
August 27, 2003 – Elpida Memory, a Tokyo, Japan JV between Hitachi and NEC, and Toppan Printing Co. have agreed to co-develop photomasks for sub-100nm DRAM chips. The photomasks will be used on chips produced at Elpida’s 300mm facility in Hiroshima.
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