September 23, 2003 – Researchers at Europe’s Inter-university MicroElectronics Center (IMEC), Leuven, Belgium, have developed a prototype tool to model and analyze noise generated on low- and high-ohmic substrates used in ultra-deep, sub-micron CMOS technologies.
The substrate noise waveform analysis (SWAN) tool includes a standard-cell library characterization and substrate-noise waveform computation to measure substrate noise generation. Noise and power-supply current are recorded in a database, followed by the extraction of switching events for each gate; combining the data allows EDA designers to calculate high-ohmic substrate noise voltages on analog nodes.
The SWAN technology is available for joint research projects either bilaterally or through IMEC’s industrial affiliation program on broadband wireless systems. IMEC says it is also exploring potential partnerships with EDA firms.