Toshiba leverages AMAT’s low-k at 90nm

August 27, 2003 – Toshiba Corp. is using Applied Material’s CVD low-k dielectric films in its 90nm CMOS4 process technology, the companies said. The processes are being used in Toshiba’s TC3000 ASICs, produced at its Oita, Japan facility.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.