AMAT licenses CMP vapor dry technology

September 30, 2003 – Applied Materials, Santa Clara, CA, has signed a deal with SCP Global Technologies to include SCP’s single-wafer vapor drying technology with Applied’s Reflexion LK CMP system. The drying technology will be used in place of a spin-rinse-dry process to help eliminate post-CMP defects such as watermarks from polished low-k surfaces, resulting in lower defects and higher yield.


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