Toshiba produces X-architecture silicon

October 10, 2003 – Toshiba Corp. says it has produced the first functional silicon based on the X-architecture.

The five-metal-layer, 90nm test chip was created following a design promoted by the X-Initiative, which uses diagonal interconnects as well as traditional right-angle (“Manhattan”) configurations. The design reduces total wire length by 14% with 27% fewer vias, according to Toshiba.

The next step for the X-Initiative is to facilitate adoption of the X-architecture for production manufacturing at all current nodes (130-90nm) and future nodes (65nm and below), with production chips ready in 2004.

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