NanoInk’s DPN lands first U.S. patent

Nov. 10, 2003 — NanoInk Inc. has received a U.S. patent for its Dip Pen Nanolithography (DPN), according to a company news release.


It’s the Chicago-based company’s first U.S. patent and second worldwide for its fabrication process for building patterns, layers and structures with nearly any molecule at resolutions fewer than 15 nanometers. DPN was invented by Chad Mirkin’s research group at Northwestern University’s Institute for Nanotechnology.


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