November 21, 2003 – ASML NV, Veldhoven, The Netherlands, and Dainippon Screen Manufacturing Co. Ltd., Kyoto, Japan, have agreed to co-develop methods for linking their track and lithography systems.
The two will install Dainippon Screen’s 300mm coater/developer in ASML’s development laboratory in Veldhoven to establish proof-of-concept, while also working to optimize process performances for next-generation lithography, including high-NA ArF, immersion ArF, and 152nm lithography.
Installation is scheduled for November 2003, with volume tool shipments slated for January 2004.