December 4, 2003 – Japan’s Super Silicon Crystal Research Institute Corp. has licensed its wafer processing equipment to South Korea’s Tera Semicon Corp. and Japan’s Shinkugiken Co., according to the Nihon Keizai Shimbun.
The companies plan to produce tools by September 2004 that can deposit films simultaneously onto two wafers using high-speed jets of silicon gas.
The institute, created by a group of Japanese wafer manufacturers, is working on development of next-generation 400mm wafers.