Intel opens wallet for EUV litho

January 26, 2004 – Intel Corp., Santa Clara, CA, will invest $20 million over three years in Cymer Inc., San Diego, CA, to help develop extreme-ultraviolet (EUV) lithography.

Cymer is working on a low-cost method of increasing source output power to meet wafer throughput requirements, with commercial deployment of the technology tentatively planned for 2009.

Pete Silverman, director of lithography capital equipment development at Intel, said the company regards development of EUV lithography for the 32nm node by 2009 as “a critical mission.”


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