Nikon aims for EUVL in ’04

January 14, 2004 – Nikon Corp., Tokyo, Japan, plans to start full-scale production of extreme ultraviolet (EUV) lithography systems this year, with a planned launch in 2006 for use with 45nm and 32nm chips.

Nikon has been a member of the EUV Lithography system Development Association since its formation in June 2002, and in January 2003 formed its own EUVL department within its precision equipment business.

The company also recently announced its plans for developing 193nm immersion lithography, with a proof-of-concept tool working in its labs; shipments of development tools are tentatively expected to begin in 2005.


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