SEMI releases new standards

February 5, 2004 – SEMI, San Jose, CA, has published 25 new standards governing various steps for manufacturing semiconductors and flat-panel displays.

The new standards, part of SEMI’s tri-annual publication cycle, join more than 670 standards on the SEMI books. Included in the new crop are guidelines for defining the quality area of an LCD mask, formats for data management in the semiconductor exposure process, and specifications for polished monocrystalline silicon carbide wafers.

A large number of the standards were initiated by committees in Japan, according to Bettina Weiss, SEMI’s director for international standards and MEMS.


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