Tegal, Sharp form high-k JV

April 13, 2004 – Tegal Corp., Petaluma, CA, and Sharp Laboratories of America, are forming a joint development program to accelerate the adoption and integration of next-generation high-k dielectrics.

The work will focus on Tegal’s nanolayer deposition technology, including deposition tools obtained through the November 2003 acquisition of Simplus Systems. The JDP will be centered at Sharp’s facilities in Camas, Washington.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.