May 13, 2004 — DuPont Photomasks Inc. has begun commercial production at its advanced photomask production facility in Dresden, Germany. The new facility will support semiconductor devices with design rules of 65nm and below.
According to BusinessWire, DuPont Photomasks’ Dresden facility includes a 1400 sq. m. cleanroom with advanced e-beam and laser photomask pattern generators, along with other advanced processing, inspection, metrology, cleaning and repair tools. Employing more than 90 people, the new Dresden facility is fully operational.
DuPont Photomasks’ Dresden facility is co-located with the Advanced Mask Technology Center (AMTC), a joint venture photomask research and development-center owned by Advanced Micro Devices, Infineon Technologies and DuPont Photomasks.