Cadence and ASML agree to develop advanced DFM solutions

June 8, 2004 — Cadence Design Systems Inc. and ASML MaskTools, an ASML business unit, have agreed to a multi-year, multimillion dollar software licensing and joint development agreement for advanced RET software solutions.

The two companies will work together to develop a tightly integrated design for manufacturability (DFM) flow.

Under the agreement, Cadence will license and co-develop two ASML MaskTools software packages: MaskWeaver, a full-chip resolution enhancement technology (RET) and optical proximity correction (OPC) mask and optimization solution, and LithoCruiser, a lithography process analysis and optimization solution.

Cadence will become the sole worldwide distributor for MaskWeaver, while both Cadence and ASML MaskTools will distribute LithoCruiser to their respective electronic design automation (EDA) and manufacturing customers.

The products will be offered as standalone and integrated solutions within the Cadence Encounter and Virtuoso design platforms.


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