June 21, 2004 – The first tools should be arriving shortly at Photronics Inc.’s Austin, TX, facility, the company said today, as it outlined its plans and timing for the installation of advanced reticle manufacturing and process technology necessary to support semiconductor manufacturers building ICs with feature sizes for the 65nm node.

The company plans to install its first manufacturing line in its Austin, TX, facility. The newly installed state-of-the-art manufacturing systems and process technology will cover all aspects of 65nm node photomask fabrication from data preparation through characterization and shipment. The first tools will begin arriving in early summer this year. A second manufacturing line, based on a copy exact strategy, will be installed in Korea in early 2005.

Photronics has been engaged in the early prototyping for the 65nm node and has begun the necessary cleanroom and infrastructure upgrades in its state-of-the-art reticle fabrication facility in Austin to prepare for systems installation.