TEL, IMEC to work on 193nm immersion litho

June 9, 2004 – While SEMATECH turns its attention to 193nm immersion lithography development, Tokyo Electron Ltd. and European research consortium IMEC have expanded their collaboration on lithography technology to include 193nm immersion, the two have announced.

Under the deal, they will investigate methods for fine-tuning resist processing to meet CD control and defect reduction goals laid out by the International Technology Roadmap for Semiconductors (ITRS). TEL’s Clean Track Act 12 coater/developer system will be installed at IMEC’s new 300mm facility in Belgium this summer.

The two have collaborated on 193nm lithography in IMEC’s 200mm facility since 1998.


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