TSMC, AWR seek common ground for 0.35-micron SiGe

July 27, 2004 – Taiwan Semiconductor Manufacturing Co. (TSMC) and El Segundo, CA-based Applied Wave Research Inc. (AWR), a provider of electronic design automation (EDA) tools, have agreed to jointly develop a design platform for TSMC’s 0.35-micron silicon germanium (SiGe) process.

Under the deal, the companies will develop process-calibrated and process-tuned device models HICUM bipolar transistor models and spiral inductor models. The platform will contain AWR’s RFIC design software, a TSMC process-design kit, and a support package. “A cost-effective RVID design platform will be a welcome addition to the growing RF wireless design community worldwide, and particularly to emerging design markets,” said Edward Wan, senior director of design services marketing for TSMC.


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