EV Group expands UV-nanoimprint consortium

August 25, 2004 – EV Group today announced that a major Canadian research organization has joined its nanoimprint lithography (NIL) consortium formed to commercialize this technology.

EV Group said the National Research Council of Canada’s Industrial Materials Institute (NRC-IMI) joined the consortium that EVG formed last year. The consortium is working to commercialize advanced nanoimprint lithography (NIL) technologies, a next-generation lithography method that utilizes a low-cost, high-resolution and large-area patterning process.

In addition, the company announced plans to sponsor and participate in COMS 2004, an Aug. 29-Sept. 2 conference in Edmonton, Alberta, that will focus on the commercialization of nano and MEMS devices. Both the consortium and the COMS 2004 sponsorship come on the heels of the company’s expansion into Canada.

Last fall, the NRC-IMI purchased an EVG520HE semi-automated hot-embossing system to pattern surfaces for various applications, from bio-recognition to magnetic data storage. In addition, DALSA Corp., the Ontario-based maker of processed silicon wafers and packaged silicon chips, purchased EVG’s GEMINI wafer bonder cluster tool and a HERCULES thick-polymer lithography tool for high-volume MEMS manufacturing.

NRC-IMI is a Canadian research center that conducts multidisciplinary research on breakthrough technologies related to materials development and processing.


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