ASML, Nikon settling patent claims

September 2, 2004 – ASML Holding NV, Veldhoven, The Netherlands, and Tokyo-based Nikon Corp. have mutually agreed to suspend legal proceedings in the US and Asia concerning disputed IP for lithography systems.

The resulting settlement involves an undisclosed payment from ASML to Nikon and a cross-license agreement. A binding memorandum of understanding is expected later this month. The two had been in litigation since 2001, with patent infringement allegations filed by both sides.


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