JMAR awarded additional $2.1 million x-ray mask funding

September 30, 2004 – JMAR Technologies Inc.’s systems division has received an additional $2.1 million in funding from the US government Naval Air Warfare Center to procure sub-100nm feature x-ray masks for next-generation lithography, and to produce Zone Plate optics for x-ray microscopes and x-ray nanoprobes.

The x-ray masks developed through this program will be used to demonstrate fabrication of high-density CRAM using x-ray lithography with 35-50nm contact holes for high-priority military and space applications, said the company. The x-ray masks will also produce x-ray optical elements known as “Zone Plates” which carry out the same functions as lenses for visual wavelength light, and are key components of x-ray microscopes and x-ray nanoprobe tools.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.