Nov. 17, 2004 – Nanoimprint lithography appears to be the best long-term solution to cutting costs and increasing performance in computer chips, but pioneers of the emerging technique should band together to press their case, according to a new report.

Lux Research Inc.’s  “Optical Lithography’s Last Stand” finds that nanolithography, whose five main players are EVG, Molecular Imprints, Nanonex, Obducat and SUSS MicroTec, is well positioned to take over optical lithography in the next decade because of its technical advantages, increasing research activity and feasible solutions to technical challenges. The report said that the nano techniques for laying down patterns of desired circuits on a silicon wafer could solve the growing challenge of putting more circuits into less space.

However, the report advised nanolithography pioneers to form an alliance that would “advance their common interests and battle skepticism from major chipmakers.” It also identified two potential competitors to nanoimprint: extreme ultraviolet and X-ray projection.