Applied adds AmberWave IP

December 14, 2004 – Applied Materials Inc., Santa Clara, CA, has licensed strained-silicon technology from AmberWave Systems Corp., Salem, NH, for use in its Centura RP Epi system.

The companies said the combined technologies already have been used to create a “highly-manufacturable” 300mm strained silicon epitaxial process for advanced substrates used in high-performance transistor designs.

“This strained silicon solution can dramatically accelerate the development process for chipmakers and wafer manufacturers without a large investment in process engineering,” said Randhir Thakur, VP and GM of Applied’s frontend products group.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.