Applied Materials, DuPont Photomasks collaborate for 90nm, 65nm Masks

December 2, 2004 – Applied Materials Inc. and DuPont Photomasks Inc. have agreed to a joint development program (JDP) for advanced photomasks supporting 90nm and 65nm technology.

The collaboration will bring Applied Materials’ newest deep ultraviolet laser-based pattern generation system, the Applied ALTA(R) 4700, into production early next year at DuPont Photomasks’ advanced photomask production facility in Round Rock, TX.

Technologists from Applied Materials and DuPont Photomasks’ Round Rock and Dresden sites will share engineering expertise and utilize their previous experience with the ALTA 4300 to bring the ALTA 4700 rapidly to commercial production. In addition, the JDP will benefit from the ability to test a variety of device patterns on the ALTA 4700 from DuPont Photomasks’ large and diverse customer base.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.