The relationship was described as a collaboration. Applied did not indicate that it intends to become a wafer supplier; however, through process development work, it can demonstrate to Centura customers how the tool can be used to create strained silicon on their own wafers.
(December 16, 2004) Scharding, Austria — EV Group (EVG) says that it will install the first example of a new fully automated UV step-and-repeat nanoimprint lithography (UV-NIL) system at non-profit research organization, AMO GmbH in Germany, during the first quarter of 2005. AMO has been participating in joint-development programs with EVG in the area of UV-NIL since 1997.