ASML, Micronic ink maskless litho deal

December 21, 2004 – Micronic Laser Systems AB, Taby, Sweden, has agreed to license its patents relating to spatial light modulator (SLM) and datapath technologies to ASML Netherlands BV for use in optical maskless lithography for semiconductor applications. Micronic will receive royalty payments plus 20 million euros against future royalties, as well as royalty-free rights to use ASML’s development of the SML technology.

Aside from royalty incomes, the deal also offers synergies concerning the development of future SML technologies for incorporation into Micronic’s “Sigma” brand laser pattern generators, stated Sven Lofquist, Micronic president and CEO.


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