EAST HILLS, N.Y.-LCD manufacturing plants in Asia are among the first to receive Pall Corp. Microelectronics Group’s (www.pall.com) new high-flow-rate filters, designed specifically for high-flow, high-purity bulk gas delivery systems used in next generation display and semiconductor manufacturing processes.
High flow rates are required for the manufacturing of large-area displays and 300-mm wafers, including the need to filter bulk nitrogen and clean dry air at flow rates in excess of 1,700 normal cubic meters per hour per 1,000 standard cubic feet per minute.
Based on Pall’s patented Ultipleat technology, the Emflon filters are designed to offer flow rates of up to 6,500 normal cubic meters per hour from a single 1,016-mm cartridge, and a removal rating of 0.003 µm. The company says one of its filters can replace a typical filter system that requires up to thirty standard 254-mm filters.
High-flow, high-purity filters for bulk gas delivery systems used in next-gen LCD and semiconductor manufacturing promise significant space and maintenance savings.
“Manufacturers continue to seek economies of scale by adopting larger substrates,” notes Steve Chisholm, president of Pall Microelectronics Group. “High-flow Emflon filter systems allow these customers to use smaller filter housings, saving precious fab space.”
Chisholm claims that LCD and semiconductor customers can realize an average savings of greater than 20 percent on system installations, and greater than 50 percent on system maintenance.