Molecular Imprints launches new nanoimprint tool

Feb. 28, 2005 — Molecular Imprints Inc. of Austin, Texas, announced the launch of its Imprio 250 lithography system today. The company says its newest nanoimprint system offers sub-50 nm half-pitch resolution, sub-10 nm alignment, as well as integrated magnification control, and delivers high resolution and precision alignment for customers seeking cost-effective sub-50 nm lithography.

Molecular Imprints says the tool is built to semiconductor industry standards around a core platform using Step and Flash Imprint Lithography technology. It includes fully automated wafer handling up to 300 mm and automated template loading capability. The tool has a novel, in-liquid alignment and magnification control system for precision overlay for advanced lithography applications.

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