March 17, 2005 – Therma-Wave Inc. has announced that a leading Taiwanese DRAM semiconductor manufacturer has selected multiple Therma-Wave metrology solutions for use in its 300mm factory. The multimillion dollar order includes multiple Opti-Probe 7341 thin film metrology tools with real-time, critical-dimension capability for use in 90nm technology node production, extendible to 65nm development work. The order also includes a Therma-Probe 630XP tool for ion implant metrology.
Therma-Wave Opti-Probe tools will be used for thickness and CD measurements in both front and back-end metrology applications throughout the customer’s fab. Opti-Probe will be used to measure thin films applied by CVD and removed by plasma etching.