UMC adopts Mentor Graphics EDT tool

March 25, 2005 – Mentor Graphics Corp. has announced that foundry UMC has adopted its TestKompress embedded deterministic test (EDT) tool for use in 90 and 130nm reference flows.

Throughout trials at UMC, the TestKompress tool demonstrated an ability to reduce test time and data size by 80x and achieve 99% test coverage. The tool delivers test quality and low-test-cost benefits of embedded compression with relatively little impact on methodologies and design effort. It fits into any scan-based design flow, and features robust x-state tolerance that eliminates the need to add logic or adhere to strict design requirements imposed by the test structures. Additionally, the TestKompress tool includes at-speed test capabilities to improve detection of speed-related defects at smaller process technologies.

“TestKompress adheres to our commitment to provide customers with services and methodologies for optimal silicon development, and we are pleased to offer it to customers using our 130 and 90nm flows,” said Ken Liou, director of the IP Development and Design Support Division at UMC.


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