ProMOS selects Varian’s VIISta ion implanter

April 22, 2005 – Varian Semiconductor Equipment Associates Inc. has announced that it has won multiple orders for its single wafer VIISta HC high-current ion implanter from ProMOS Technologies Inc. ProMOS ordered the tools to support the expansion of its 300mm memory fab in Taichung, Taiwan.

Eddie Chen, VP, manufacturing group at ProMOS Taichung, said, “Varian Semiconductor’s leading-edge VIISta HC high current ion implanter is essential to our manufacturing goals of optimizing productivity and continuous yield improvements. We are pleased to collaborate with Varian Semiconductor to support the manufacturing of 90nm and beyond process technologies at ProMOS.”


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