SUSS announces new lithography tool

April 5, 2005 — SUSS MicroTec announced a nanoimprint lithography system that combines hot and cold embossing on wafer in a step and repeat mode.

The SUSS NPS300 Nano Patterning Stepper was developed within the European Union’s Sixth Framework Program in cooperation with the VTT Microelectronics Center during a one-year project. It is available either as a manually loaded machine or as a fully automated system. SUSS says the device achieves a sub-20 nm imprinting resolution for cold and hot embossing applications.


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