Photronics launches strategy to drive advanced photomask R&D

May 9, 2005 – Photronics has announced its strategy to drive advanced photomask R&D through a network of global corporate R&D centers. Photronics said its photomask R&D center in Austin, TX, and the recently launched Photronics-PKL R&D center in Cheon-an, Choong-nam, Korea, are working to develop next-generation fabrication processes to manufacture high performance IC products down through the 45nm node.

The Austin R&D center is scheduled to begin 65nm qualification in 2005 and has launched the infrastructure options sorting phase for 45nm technology, the company noted.

The new corporate R&D center in Korea is being tasked with developing 65nm and 45nm mask technologies required by customers located primarily in the Asia region, and also will be developing FPD masks used to fabricate TFT-LCD products using Generation 7 and beyond processes.

Photronics said R&D centers will also support the development and application of custom imaging solutions to address emerging opportunities in imprint lithography and nanotechnology.


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