Honeywell to manufacture 300mm PVD sputtering targets in A/P

July 13, 2005 – Honeywell has announced that its Electronic Materials business will expand its Asia/Pacific manufacturing capabilities to include the production of 300mm PVD (physical vapor deposition) sputtering targets at its Korea plant.

Located in Jincheon, Korea, Honeywell’s plant will provide a local supply of leading technology materials used for the production of semiconductors. Honeywell’s current capabilities at the site include the production of materials supporting 200mm semiconductor manufacturing.

Honeywell’s new Asia/Pacific 300mm PVD target manufacturing is scheduled to be completed in the 2H05.

In late 2004, Honeywell officially opened its Asia/Pacific Headquarters and Technology/R&D Center in Zhang Jiang High-Tech Park in the Pudong New Area of Shanghai, China. The facility encompasses more than 161,500 square feet (15,000 square meters) of floor space, and houses development laboratories, testing centers and overall support for Honeywell operations throughout Asia/Pacific, including its Electronic Materials business.


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