JMAR awarded $7.5 million more by NAVAIR for x-ray mask program

July 1, 2005 – The US government’s Naval Air Warfare Center (NAVAIR), under DARPA sponsorship, has granted JMAR Technologies Inc. a two-year extension valued at $7.5 million to its existing three-year $10 million contract to continue development of sub-100nm feature x-ray masks for next generation lithography and production of Zone Plate optics for x-ray microscopes and nanoprobes.

NAVAIR has also released $3.6 million of funding to support continuing work under this contract.

Under this contract, JMAR will use its patented, advanced x-ray lithography stepper technology and newly developed x-ray masks to demonstrate fabrication of high-density CRAM integrated circuits with 35-50nm contact holes enabling 4 Mb and higher densities for high-priority military and space applications.

The x-ray masks developed through this program will also be used to produce the x-ray optical elements known as Zone Plates, which collect and focus x-rays and are key components of x-ray Microscopes and x-ray Nano Probe tools.


Easily post a comment below using your Linkedin, Twitter, Google or Facebook account. Comments won't automatically be posted to your social media accounts unless you select to share.