Aug. 31, 2005 – Molecular Imprints Inc., a provider of nanoimprint lithography technology, announces the filing of the 300th patent application worldwide related to its S-FIL, or step-and-flash imprint lithography, technology.
The company says that more than 40 patents have been allowed or issued. S.V. Sreenivasan, Molecular Imprints’ chief technology officer, said in a prepared statement that the patent applications are all related to aspects of S-FIL but that many also address other forms of imprint lithography, and nano and 3D patterning in general.