August 17, 2005 – Rohm and Haas Electronic Materials LLC and JSR Corp. have settled patent litigations in the US District Court for the District of Columbia and the European Patent Office related to the use of ethyl lactate solvent in photoresists. Under the settlement, the parties each obtained a worldwide patent license from the other party and acknowledged the validity of the patents.
“We are very pleased to reach a settlement with JSR and once again focus our efforts on the needs of our customers,” said Dr. Yi Hyon Paik, president, Rohm and Haas Electronic Materials Microelectronic Technologies. “The settlement validates the patent positions of Rohm and Haas and JSR.”
Other terms of the license agreement were not disclosed.