ASML licenses technology to Toshiba

September 20, 2005 – ASML Holding NV today announced that electronics giant Toshiba Corp. purchased a license for its patented lithography technology that helps manufacturers increase their chip yields. Toshiba joins more than 20 chipmakers and foundries in adopting ASML’s Scattering Bar Technology. Toshiba will use the technology in the production of semiconductor devices.

At the heart of this licensing agreement is Scattering Bar Technology, which ASML invented as part of its exclusive Ultra k1 Portfolio. The technology increases the yield of chips per wafer through improved depth of focus, CD uniformity, and other key lithography features. Additional customer benefits include enhancing the performance and value of ASML lithography tools and extending the return on investment for existing systems.

Hitachi High-Technologies Corporation, headquartered in Tokyo and serving as the exclusive sales agent for ASML in Japan, was instrumental in securing the order.


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