December 8, 2005 – ASML said it plans to ship 20-25 immersion lithography systems in 2006, including shipments to Japan; its Twinscan XT:1700i tool is now being qualified, with the first one scheduled to be shipped in 1Q06. ASML also said it is prepping two EUV alpha tools for delivery to IMEC and Albany NanoTech in 2Q06.
Toppan Photomasks Inc., Round Rock, TX, said that it has delivered EUV masks to ASML in order to qualify its alpha-version full-field EUV scanner (NA=0.25). The masks were made at Toppan’s Dresden manufacturing campus which opened in 2004.
Meanwhile, Carl Zeiss SMT said it has shipped an optical system for EUV lithography to ASML for use in one of the alpha systems, but did not say when it would ship the second optical system.