Axcelis debuts ion implanter for sub-65nm chipmaking

January 20, 2006 – Axcelis Technologies Inc., Beverly, MA, has unveiled the newest addition to its Optima line of ion implanters, targeting both traditional high-dose implants as well as applications for sub-65nm device manufacturing.

The Optima HD has an energy range of 200-80eV to cover traditional high-dose implants as well as mid-dose applications overlap, and supports molecular and hydrogen implants for emerging dual poly gate and silicon-on-insulator applications.

An advanced spot beam technology ensures all points across the wafer see the same beam at the same angle, enabling exceptional implant repeatability. The system also uses Axcelis’ proprietary RadiusScan hardware that allows the system to cover a broad dose range, enabling customers to address both traditional and emerging high dose implant needs.

Initial shipments are slated for 2Q06.


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