January 27, 2006 – Xtreme Technologies GmbH, a joint venture between Jenoptik AG and Ushio Inc. developing light sources for extreme-ultraviolet (EUV) photolithography, has received an undisclosed amount of funding from Intel Corp.’s investment arm, Intel Capital to accelerate development and commercialization of the technology.

Xtreme, under the three-year EC-backed “More Moore” project, revealed in December that in a proof-of-principle experiment it had developed an 800W light source at origin with up to 80W at the intermediate focus, approaching the 1kW output seen as a requirement for EUV use in volume production.

EUV is on the International Technology Roadmap for Semiconductors as a candidate to replace existing lithography techniques for chip manufacturing at the 32nm node by the end of the decade. Intel has been a fundamental backer of EUV technology, with longtime investments in light source provider Cymer.