January 10, 2006 – Mentor Graphics Corp., Wilsonville, OR, has unveiled a new product to help verify post-optical-proximity correction (OPC) output, and help chipmakers minimize costly mask respins and delays getting products through production.

“For 90nm and smaller technology nodes, the complexity of OPC and the constraints that go with it require verification to prevent silicon failures,” said Joe Sawicki, VP and GM for Mentor Graphics’ design-to-silicon division. “Some customer sources claim that 50% of all mask respins can be avoided by simply verifying the OPC for the effects of process variability.”

Calibre OPCverity uses simulation models from the company’s Calibre OPCpro to verify reticle-enhancement technology (RET) for advanced process conditions in production, including immersion lithography. The pixel-based simulation engine (scalable to hundreds of CPUs, for flat or hierarchical data) accounts for effects of process variability using algorithms defining conditions (dose and focus) that affect pattern transfer. A user interface enables integration of RET mask verification flow into existing post-layout flows in less than 24 hrs, the company said.

Pricing for Calibre OPCverify starts at $80,000.