Photronics to build 45nm photomask fab in Korea

Jan. 12, 2006 – Photronics Inc. (Nasdaq: PLAB), a supplier of photomask-based imaging solutions for the electronics and display industries, announced plans to build a photomask fabrication facility in Korea to support the development and volume production of photomask technologies required to produce semiconductors utilizing 65 nanometer and 45 nanometer and below production processes.

The company said it is in the final stages of securing a site suitable for supporting the facility. A ground breaking ceremony is being planned for late in the second half of 2006 with construction slated to be completed in the second half of calendar 2007. Photronics expects that over the next several years investment in the new infrastructure, which will include the redeployment of certain manufacturing systems and process technologies, could range between $150 million and $300 million.

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