Jan. 19, 2006 – SUSS MicroTec, a supplier of full-field exposure systems, announced that it has received eight orders for a total of thirteen machines for its new MA200Compact system.
The company said seven machines were installed year and that the rest will be shipped in 2006. The MA200Compact is a production full-field exposure system with a new feature that enables the use of cost effective mask aligner technology in areas where 1x steppers used to dominate.
Benefits of the system are high precision, low cost of ownership and flexibility for processing wafers of different sizes and photo resist thickness, according to SUSS.