KLA-Tencor spotlights Cymer source for litho tool

February 22, 2006 – Extending joint work on simulating laser bandwidth on critical dimensions (CD), KLA-Tencor Inc. will add Cymer Inc.’s light source spectra into its Prolith lithography optimization tool, to enable users to model the effects of changes in light source spectral characteristics on their advanced lithography processes. KLA and Cymer, who have been collaborating for more than five years on simulating the impact of laser bandwidth on CD, will work to jointly develop enhancements to the capability for future versions.

As effects of laser bandwidth on critical dimensions are magnified with higher numerical apertures and shrinking process windows, “we see a growing need to provide a more accurate representation of the light source spectrum available to our customers,” said Edward Charrier, GM, process analysis division, KLA-Tencor. “By leveraging Cymer’s laser spectral data and expertise, we can offer customers a truly comprehensive representation of the complete optical lithography process, and provide an added level of accuracy.”


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