Nanometrics sues Nova over CD patents

March 31, 2006 – Nanometrics Inc. has filed a complaint in the US District Court of Northern California against Israeli process-control systems provider Nova Measuring Instruments Ltd., alleging infringement upon a Nanometrics patent relating to its ultraviolet reflectrometry and optical critical dimension technologies. The patent describes a method for “determining absolute reflectance of a material in the ultraviolet range.”


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