AOI unveils scatterometry add-on

April 5, 2006 – Accent Optical Technologies has developed a new scatterometry acceleration tool to provide advanced critical dimension (CD) metrology for 65nm device manufacturing.

The Matchbox computation engine enhances productivity of scatterometry-based CD and profile metrology systems by processing grating diffraction signature matching in parallel to signal acquisition by the CD metrology tool, increasing throughput by up to 20% and giving users more flexibility in sampling strategy, line balancing, and using multiple libraries, the company claims. Matchbox is compatible with Accent’s PCM3 library generation system and CDS200 metrology system.

“Leading semiconductor manufactures are seeking CD metrology solutions with one second MAM time (move-acquire-measure) and computation time can be a significant portion of the MAM budget for complex multi-parameter problems,” stated David Doyle, Accent’s product marketing manager. “Maximizing metrology tool throughput enables greater sampling and improves the robustness of lot-to-lot or wafer-to-wafer control in high volume manufacturing.”


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